|
Volumn 40, Issue 18, 2005, Pages 4991-4993
|
MOCVD route to In2O3 thin films on SiO2 substrates
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CRYSTAL STRUCTURE;
GRAIN SIZE AND SHAPE;
INDIUM COMPOUNDS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MIXTURES;
REACTION KINETICS;
SILICA;
SUBSTRATES;
X RAY DIFFRACTION;
CARRIER GASES;
OXYGEN MIXTURES;
SUBSTRATE TEMPERATURE;
THIN FILMS;
|
EID: 25444512090
PISSN: 00222461
EISSN: None
Source Type: Journal
DOI: 10.1007/s10853-005-1424-y Document Type: Article |
Times cited : (9)
|
References (16)
|