Conduction in ultrathin ruthenium electrodes prepared by atomic layer deposition

Materials Letters

Volumn 73, Issue , 2012, Pages 43-46

  Gregorczyk, K ^a   Banerjee, P ^a,b   Rubloff, G W ^a  

^a UNIVERSITY OF MARYLAND   (United States)

^b WASHINGTON UNIVERSITY IN ST LOUIS   (United States)

Author keywords

Atomic layer deposition; Coatings; Electrodes; Ruthenium; Thin film; Ultrathin

Indexed keywords

DOMINANT MECHANISM; ELECTRON PHONON SCATTERING; GRAIN BOUNDARY SCATTERING; NANO-STRUCTURED; TEMPERATURE COEFFICIENT OF RESISTIVITY; ULTRA-THIN;

COATINGS; ELECTRODES; ELECTRON DIFFRACTION; ELECTRON SCATTERING; GRAIN BOUNDARIES; RUTHENIUM; THIN FILMS;

ATOMIC LAYER DEPOSITION;

EID: 84856067492     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2011.12.117     Document Type: Article

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