Growth of Ru and RuO2 films by metal-organic chemical vapour deposition

Journal De Physique. IV : JP

Volumn 11, Issue 3, 2001, Pages

  Frohlich F ^a   Machajdik D ^a   Cambel, V ^a   Fedor, J ^a   Pisch, A ^a   Lindner, J ^a  

^a INSTITUTE OF CHEMISTRY   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; EVAPORATION; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; RUTHENIUM COMPOUNDS; SUBSTRATES; THERMODYNAMICS; THIN FILMS;

POWDER PRECURSORS;

FILM GROWTH;

EID: 0034855015     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:2001341     Document Type: Conference Paper

References (16)

1. 2) electrodes