Multilayer alumina and titania optical coatings prepared by atomic layer deposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7041, Issue , 2008, Pages

  Biluš Abaffy, Nemo ^a   Evans, Peter ^b   Triani, Gerry ^b   McCulloch, Dougal ^a  

^a RMIT UNIVERSITY   (Australia)

^b AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

ALD; Alumina; Antireflection; Atomic layer deposition; Dielectric; Optical coating; Thin film; Titania

Indexed keywords

ALUMINA; AMORPHOUS FILMS; ATOMIC LAYER DEPOSITION; ATOMIC PHYSICS; ATOMS; COATINGS; DEPOSITION; MULTILAYERS; OPTICAL COATINGS; OPTICAL FILMS; OPTICAL MATERIALS; OPTICAL MULTILAYERS; OPTICAL PROPERTIES; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; SOLIDS; THICK FILMS; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES;

ALD; ALTERNATING LAYERS; ALUMINA LAYERS; ANTIREFLECTION; ANTIREFLECTIVE COATINGS; ATOMIC LAYER DEPOSITION (ALD; ATOMIC LAYERS; DIELECTRIC; DIFFERENT PRECURSORS; LOW TEMPERATURES; MULTILAYER COATINGS; OPTICAL THIN FILMS; SENSITIVE SUBSTRATES; THEORETICAL CALCULATIONS; TITANIA; TITANIA LAYERS; TITANIA THIN FILMS; UNIFORM THICKNESSES;

FILM PREPARATION;

EID: 56249105814     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.794618     Document Type: Conference Paper

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