Atomic layer deposition (ALD) for optical nanofabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7591, Issue , 2010, Pages

  Maula, Jarmo ^a  

^a Beneq Oy   (Finland)

Author keywords

ALD; Batch; Coater; Conformal; Manufacturing; Optical; Scale up; Thin film

Indexed keywords

ALD; ALD TECHNOLOGY; COMPETITIVE COSTS; CONFORMAL COATINGS; DECORATIVE COATING; ENABLING TECHNOLOGIES; FILM STRUCTURE; FREE FILMS; HIGH ASPECT RATIO; HIGH THROUGHPUT; IN-LINE; MOLECULAR LEVELS; NANOFABRICATION; NEW APPLICATIONS; NEW PRODUCT; NOVEL MATERIALS; PIN HOLES; PLANARIZATION; POROUS STRUCTURES; SCALE-UP; SUBNANOMETERS; SURFACE SMOOTHNESS; THIN-FILM TECHNOLOGY;

ASPECT RATIO; COATINGS; FABRICATION; PASSIVATION; SURFACES; TECHNOLOGY; THICK FILMS; THIN FILMS;

OPTICAL FILMS;

EID: 77951571897     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.841343     Document Type: Conference Paper

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