Nano absorbing centers: A key point in the laser damage of thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2966, Issue , 1997, Pages 315-325

  Dijon, Jean ^a   Poiroux, T ^a   Desrumaux, C ^a  

^a CEA LETI   (France)

Author keywords

Laser conditioning; Laser damage; Optical thin films; Ultraviolet

Indexed keywords

FILMS; LASER DAMAGE; LASERS; OPTICAL MATERIALS; SILICON COMPOUNDS; SOLIDS; THIN FILMS;

ANNEALED SAMPLES; DAMAGE MORPHOLOGIES; DAMAGE THRESHOLDS; DEPOSITION PROCESSES; METAL DIELECTRICS; OPTICAL THIN FILMS; THERMAL ANNEALING; ULTRAVIOLET;

OPTICAL FILMS;

EID: 58149316379     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.274229     Document Type: Conference Paper

References (11)

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