Laser damage properties of TiO2/Al2O3 thin films grown by atomic layer deposition

Applied Optics

Volumn 50, Issue 24, 2011, Pages 4720-4727

  Wei, Yaowei ^a   Liu, Hao ^a   Sheng, Ouyang ^a   Liu, Zhichao ^a   Chen, Songlin ^a   Yang, Liming ^a  

^a CHENGDU FINE OPTICAL ENGINEERING RESEARCH CENTER   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; DEPOSITION; DEPOSITION RATES; FILM PREPARATION; FUSED SILICA; MICROSTRUCTURE; SILICA; THIN FILMS; TITANIUM DIOXIDE; X RAY DIFFRACTION;

DAMAGE MORPHOLOGY; DAMAGE PROPERTIES; DAMAGE TESTS; DEPOSITION TEMPERATURES; DIFFERENTIAL INTERFERENCE CONTRAST MICROSCOPES; LASER DAMAGE RESISTANCE; LASER INDUCED DAMAGE THRESHOLDS; THIN FILM MICROSTRUCTURES;

LASER DAMAGE;

EID: 80051899671     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.50.004720     Document Type: Article

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