Encapsulation of low-refractive-index SiO2 nanorods by Al 2O3 with atomic layer deposition

Optics Express

Volumn 15, Issue 24, 2007, Pages 16285-16291

  Kim, Sangho S ^a   Gabriel, Nicholas T ^a   Song, Woo Bin ^a   Talghader, Joseph J ^a  

^a University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; BRAGG REFLECTORS; ENCAPSULATION; OPTICAL COATINGS; REFRACTIVE INDEX; SILICA; THIN FILMS;

COEFFICIENT OF THERMAL EXPANSION (CTE); DISTRIBUTED BRAGG REFLECTOR (DBR); HUMID ATMOSPHERES;

NANORODS;

EID: 36749104212     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.016285     Document Type: Article

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