Multiscale modeling of atomic layer deposition processes

Proceedings of the American Control Conference

Volumn , Issue , 2009, Pages 2495-2500

  Dwivedi, Vivek ^a   Adomaitis, Raymond A ^a  

^a UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA FILMS; ATOMIC LAYER; CONTINUUM DESCRIPTION; EXPOSURE LEVEL; GAS TRANSPORT; MACROSCOPIC LEVELS; MICROSCOPIC SCALE; MONTE CARLO SIMULATION; MULTI-SCALE MODELING; MULTI-SCALE SYSTEM; MULTISCALES; NANOPOROUS MATERIALS; NONUNIFORM; SIMULATION RESULT; TRIMETHYALUMINUM;

ALUMINA; MONTE CARLO METHODS; NANOPORES; SIMULATORS;

FILM GROWTH;

EID: 70449633129     PISSN: 07431619     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ACC.2009.5160582     Document Type: Conference Paper

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