25 nm pitch comparison between a traceable x-ray diffractometer and a metrological atomic force microscope

Measurement Science and Technology

Volumn 23, Issue 1, 2012, Pages

  Misumi, Ichiko ^a   Kitta, Jun Ichiro ^b   Fujimoto, Hiroyuki ^a   Gonda, Satoshi ^a   Azuma, Yasushi ^a   Maeda, Keisuke ^b   Kurosawa, Tomizo ^b   Ito, Yoshiyasu ^c   Omote, Kazuhiko ^c   Nakayama, Yoshinori ^d   Kawada, Hiroki ^e  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Japan Quality Assurance Organization JQA   (Japan)

^c RIGAKU CORPORATION   (Japan)

^d HITACHI LTD   (Japan)

^e HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION; FILM PREPARATION; SCANNING ELECTRON MICROSCOPY; STANDARDS;

1D GRATING; CRITICAL-DIMENSION SCANNING ELECTRON MICROSCOPES; METROLOGICAL ATOMIC FORCE MICROSCOPE; MULTILAYER THIN FILM STRUCTURE; ONE-DIMENSIONAL GRATINGS; REFERENCE STANDARD; X RAY DIFFRACTOMETERS;

DIFFRACTOMETERS;

EID: 84855410117     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/23/1/015002     Document Type: Article

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