Multilaboratory comparison of traceable atomic force microscope measurements of a 70-nm grating pitch standard

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 10, Issue 1, 2011, Pages

  Dixson, Ronald ^a   Chernoff, Donald A ^b   Wang, Shihua ^c   Vorburger, Theodore V ^a   Tan, Siew Leng ^c   Orji, Ndubuisi G ^a   Fu, Joseph ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Advanced Surface Microscopy Inc   (United States)

^c Agency for Science   (Singapore)

Author keywords

atomic force microscopes, metrology; calibration; pitch; standards; traceability

Indexed keywords

ATOMIC FORCE MICROSCOPY; INTERFEROMETRY; METRIC SYSTEM; MICROSCOPES; SILICON COMPOUNDS; SILICON OXIDES; STANDARDS;

AFM; ATOMIC FORCE MICROSCOPES; DISPLACEMENT INTERFEROMETRY; GRATING PITCH; HE-NE LASERS; INTERLABORATORY COMPARISON; INTERNATIONAL SYSTEM OF UNITS; METROLOGICAL ATOMIC FORCE MICROSCOPE; NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY; OPEN LOOPS; PITCH; SCANNING RANGE; SILICON SUBSTRATES; SINGAPORE; SURFACE MICROSCOPY; TRACEABILITY; TRANSFER STANDARD;

NEON;

EID: 79955973997     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3549914     Document Type: Conference Paper

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