Picometer-scale accuracy in pitch metrology by optical diffraction and atomic force microscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6922, Issue , 2008, Pages

  Chernoff, Donald A ^a   Buhr, Egbert ^b   Burkhead, David L ^a   Diener, Alexander ^b  

^a Advanced Surface Microscopy Inc   (United States)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

Analysis of variance; Atomic force microscopy; Measurement uncertainty; Microscope calibration; Optical diffraction; Period; Pitch; Traceability

Indexed keywords

ATOMIC FORCE; MEASUREMENT UNCERTAINTY; OPTICAL DIFFRACTIONS; PERIOD; PITCH; TRACEABILITY;

ATOMIC FORCE MICROSCOPY; DIFFRACTION; RANDOM ERRORS; SYSTEMATIC ERRORS; UNCERTAINTY ANALYSIS; UNITS OF MEASUREMENT;

PROCESS CONTROL;

EID: 77954498063     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.768429     Document Type: Conference Paper

References (8)

1. Dai, G., Pohlenz, F., Dziomba, T., Xu, M., Diener, A., Koenders, L., Danzebrink, H.U., "Accurate and traceable calibration of two-dimensional gratings", Meas. Sci. Technol. 18, 415-21 (2007). (Pubitemid 46603776)
2. Buhr, E., Michaelis, W., Diener, A., and Mirandé, W., "Multi-wavelength VIS/UV optical diffractometer for highaccuracy calibration of nano-scale pitch standards", Meas. Sci. Technol. 18, 667-674 (2007). (Pubitemid 46603728)
3. Ralchenko, Yu., Kramida, A.E., Reader, J. and NIST ASD Team (2008). NIST Atomic Spectra Database (version 3.1.4), http://physics.nist.gov/asd3, National Institute of Standards and Technology, Gaithersburg, (2008).
4. BIPM, IEC, IFCC, ISO, IUPAC, IUPAP, OIML, Guide to the expression of uncertainty in measurement, ISO, Geneva, (1995).
5. Chernoff, D. A. and Burkhead, D. L., "Automated, high precision measurement of critical dimensions using the Atomic Force Microscope", J. Vac. Sci. Technol. A 17, 1457-1462 (1999). (Pubitemid 129649437)
6. Chernoff, D. A. and Lohr, J. D., "High precision calibration and feature measurement system for a scanning probe microscope", U.S. Patent 5644512 (1997).
7. Chernoff, D. A. and Lohr, J. D., "High precision calibration and feature measurement system for a scanning probe microscope", U.S. Patent 5825670 (1998).
8. Wetherill, G. Barrie, Elementary Statistical Methods, Methuen & Co., London, 263-297 (1967).