Nanometric lateral scale development using an atomic force microscope with directly traceable laser interferometers

Measurement Science and Technology

Volumn 17, Issue 7, 2006, Pages 2041-2047

  Misumi, I ^a   Gonda, S ^a   Sato, O ^a   Sugawara, K ^a   Yoshizaki, K ^a   Kurosawa, T ^b   Takatsuji, T ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

AFM; Clibration; Crtified reference material; Laser interferometer; Nanometrology; Optical diffractometer; SEM; Taceable; Ucertainty

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALIBRATION; DIFFRACTION GRATINGS; INTERFEROMETERS; MEASUREMENT THEORY; SCANNING ELECTRON MICROSCOPY;

LASER INTERFEROMETERS; NANOMETROLOGY; OPTICAL DIFFRACTOMETER; TRACEABLE; UNCERTAINITIES;

NANOTECHNOLOGY;

ATOMIC FORCE MICROSCOPY; CALIBRATION; DIFFRACTION GRATINGS; INTERFEROMETERS; MEASUREMENT THEORY; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY;

EID: 33745488179     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/17/7/051     Document Type: Conference Paper

References (23)

1. Schneir J, McWaid T H, Alexander J and Wilfley B P 1994 J. Vac. Sci. Technol. B 12 3561
2. Meli F and Thalmann R 1998 Meas. Sci. Technol. 9 1087
3. Bienias M, Gao S, Hasche K, Seemann R and Thiele K 1998 Appl. Phys. A 66 S837
4. Dai G, Pohlenz F, Danzebrink H U, Xu M, Hasche K and Wilkening G 2004 Metrological large range scanning probe microscope Rev. Sci. Instrum. 75 962
5. Dai G, Koenders L, Pohlenz F, Dziomba T and Danzebrink H U 2005 Meas. Sci. Technol. 16 1241
6. Haycocks J and Jackson K 2005 Precis. Eng. 29 168
7. Gonda S, Doi T, Kurosawa T, Tanimura Y, Hisata N, Yamagishi T, Fujimoto H and Yukawa H 1999 Rev. Sci. Instrum. 70 3362
8. Misumi I et al 2005 Meas. Sci. Technol. 6 2080
9. Misumi I, Gonda S, Kurosawa T and Takamasu K 2003 Meas. Sci. Technol. 14 463
10. Misumi I et al 2003 Meas. Sci. Technol. 14 2065
11. Misumi I, Gonda S, Kurosawa T, Azuma Y, Fujimoto T, Kojima I, Sakurai T, Ohmi T and Takamasu K 2006 Precis. Eng. 30 13
12. VLSI Standards Inc. homepage http://www.vlsistandards.com/home/default. asp
13. Advanced Surface Microscopy Inc. homepage http://www.asmicro.com
14. Hitachi High-Tech Science Systems Corp. homepage http://www.hitachi- science.co.jp/english/index.html
15. NTT Advanced Technology Corporation homepage http://www.ntt-at.com/index. html
16. Ishikawa J 1995 Appl. Opt. 34 6095
17. Haitjema H, Schellekens P H J and Wetzels S F C L 2000 Metrologia 37 25
18. ISO Guide 30 1992 Terms and definitions used in connection with reference materials
19. Nakayama Y 1990 J. Vac. Sci. Technol. B 8 1836
20. BIPM, IEC, IFCC, ISO, IUPAC, IUPAP, OIML 1995 Guide to the Expression of Uncertainty in Measurement (Geneva: ISO)
21. Yacoot A and Koenders L 2003 Meas. Sci. Technol. 14 N59
22. Keem T, Gonda S, Misumi I, Huang Q and Kurosawa T 2004 Appl. Opt. 43 2443
23. Keem T, Gonda S, Misumi I, Huang Q and Kurosawa T 2005 Appl. Opt. 44 3492