Nanometric lateral scale development with Si/SiO2 multilayer thin-film structures and improvement of uncertainty evaluation using analysis of variance

Measurement Science and Technology

Volumn 19, Issue 4, 2008, Pages

  Misumi, Ichiko ^a   Lu, Mingzi ^a   Tanaka, Hideyuki ^a   Sugawara, Kentaro ^a   Gonda, Satoshi ^a   Kurosawa, Tomizo ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Japan Quality Assurance Organization JQA   (Japan)

Author keywords

AFM; ANOVA; Calibration; Nanometric lateral scale; Silicon; Uncertainty

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALIBRATION; INTERFEROMETERS; SILICON; UNCERTAINTY ANALYSIS;

MULTILAYER THIN-FILM STRUCTURES; NANOMETRIC LATERAL SCALE;

THIN FILMS;

ATOMIC FORCE MICROSCOPY; CALIBRATION; INTERFEROMETERS; SILICON; THIN FILMS; UNCERTAINTY ANALYSIS;

EID: 42549151876     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/19/4/045101     Document Type: Article

References (19)