Insights on the deposition mechanism of sputtered amorphous carbon films

Carbon

Volumn 37, Issue 5, 1999, Pages 765-769

  Logothetidis, S ^a   Gioti, M ^a   Patsalas, P ^a   Charitidis, C ^a  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ARGON; CHEMICAL BONDS; COMPRESSIVE STRENGTH; CRYSTAL MICROSTRUCTURE; FILM GROWTH; HARDNESS; ION BOMBARDMENT; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; SPUTTER DEPOSITION;

AMORPHOUS CARBON FILMS;

CARBON;

EID: 0032668291     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0008-6223(98)00268-1     Document Type: Article

References (28)

1. Bhushan B, Kellock AJ, Cho NH, Ager W III. J. Mater Res 1992;7, 404.
2. McKenzie DR, Muller D, Pailthorpe BA. Phys Rev Lett 1991;67, 773.
3. Fallon PJ, Veerasamy VS, Davis CA, Robertson J, Amaratunga GAJ, Milne WI, Koskinen J. Phys Rev B, 1993;48, 4777.
4. Silva SRP, Xu S, Tay BX, Tan HS, Milne WI. Appl Phys Lett 1996;69 (4), 491.
5. Lifshitz Y, Kasi SR, Rabalais JW, Eckstein W. Phys Rev B 1990;41, 16468.
6. Lifshitz Y, Lempert G, Grossman E. Phys Rev Lett 1997;72, 2753.
7. Cuomo JJ, Pappas DL, Bruley J, Doyle JP, Saenger KL. J Appl Phys 1991;70, 1706.
8. Xiong F, Wang YY, Chang RPH. Phys Rev B 1993;48, 8016.
9. André B, Rossi F, van Veen A, Mijnarends PE, Schut H, Delplancke MP. Thin Solid Films 1994;241, 171.
10. Schwan J, Ulrich S, Roth H, Ehrhardt H, Silva SRP, Robertson J, Samienski R, Brenn R. J Appl Phys 1996;79 (3), 1416.
11. Schwan J, Ulrich S, Theel T, Roth H, Ehrhardt H, Becker P, Silva SRP. J Appl Phys 1997;82(12), 6024.
12. Mounier E, Pauleau Y. Diam Real Mater 1997;6, 1182.
13. Logothetidis S. Appl Phys Lett 1996;69, 158.
14. Logothetidis S, Gioti M. Mater Sci Eng B, 1997;46, 119.
15. Gioti M, Logothetidis S. Diam Relat Mater 1998;7, 444.
16. Seitz F, Koehler JS. Sol St Phys 1956;2, 305.
17. Müller KH. Phys Rev B 1987;35, 7906.
18. Hofsäss H.et al. Appl Phys A, Mater Sci Processing. 66:1998;153.
19. Robertson J. Diam Rel Mat. 3:1994;361.
20. Davis C.A. Thin Solid Films. 226:1993;30.
21. Logothetidis S., Stergioudis G. Appl Phys Lett. 71:1997;2463.
22. Logothetidis S., Petalas J., Ves S. J Appl Phys. 79:1996;1040.
23. Chhowalla M., Robertson J., Chen C.W., Silva S.R.P., Davis C.A., Amaratunga G.A.J., Milne W.I. J Appl Phys. 81:1997;139.
24. Aspnes D.E. Thin Solid Films. 89:1982;249.
25. Kisly PS. In: Almond EA, Brookes CA, Warren R, editors. Proc of the Int Conf on the Science of Hard Materials, 1984.
26. Kelires P.C. Phys Rev B. 47:1993;1829.
27. Cohen M.L. Phys Rev B. 43:1991;6742.
28. Amaratunga G.A.J., Chhowalla M., Kielly G.J., Alexandrou I., Aharonov R., Devenish R.M. Nature. 383:1996;321.