Deposition and modification of titanium dioxide thin films by filtered arc deposition

Thin Solid Films

Volumn 360, Issue 1-2, 2000, Pages 241-249

  Bendavid, A ^a   Martin, P J ^a   Takikawa, H ^b  

^a CSIRO   (Australia)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; DEPOSITION; ELASTIC MODULI; ELLIPSOMETRY; GLASS; HARDNESS; OPTICAL VARIABLES MEASUREMENT; REFRACTIVE INDEX; SILICON WAFERS; STRUCTURE (COMPOSITION); THIN FILMS; X RAY DIFFRACTION ANALYSIS;

FILTERED ARC DEPOSITION; SPECTROSCOPIC ELLIPSOMETRY; STRUCTURAL PROPERTIES;

TITANIUM DIOXIDE;

EID: 0034140213     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00937-2     Document Type: Article

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