Elastic behaviour of titanium dioxide films on polyimide substrates studied by in situ tensile testing in a X-ray diffractometer

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 268, Issue 3-4, 2010, Pages 365-369

  Bontempi, Elza ^a   Zanola, Paolo ^a   Gelfi, Marcello ^a   Zucca, Marcello ^a   Depero, Laura E ^a   Girault, Baptiste ^b   Goudeau, Philippe ^b   Geandier, Guillaume ^b   Bourhis, Eric Le ^b   Renault, Pierre Olivier ^b  

^a UNIVERSITY OF BRESCIA   (Italy)

^b UNIVERSITÉ DE POITIERS   (France)

Author keywords

Atomic Layer Deposition; Elastic properties; In situ tensile testing; Titanium oxide; X ray diffraction

Indexed keywords

2D IMAGES; ADVANCED THIN FILMS; ANATASE FILMS; ATOMIC-LEVEL DEPOSITION; BULK SUBSTRATES; DEPOSITION PROCESS; ELASTIC BEHAVIOUR; ELASTIC PROPERTIES; EXPERIMENTAL CONDITIONS; HIGH QUALITY; IN-SITU TENSILE TESTING; LABORATORY EQUIPMENTS; LAYER THICKNESS; NEW DEVICES; PLATE DETECTORS; POLYIMIDE SUBSTRATE; POTENTIAL DEPOSITION; REACTION CYCLES; SYNCHROTRON BEAMLINES; THIN FILM MATERIAL; THIN LAYERS; TIO; TITANIUM DIOXIDE FILMS; X RAY DIFFRACTOMETERS; XRD;

ATOMIC LAYER DEPOSITION; ATOMS; DIFFRACTION; DIFFRACTOMETERS; ELASTICITY; HOLOGRAPHIC INTERFEROMETRY; IMAGE PROCESSING; MATERIALS TESTING APPARATUS; POLYIMIDES; SYNCHROTRONS; TENSILE STRENGTH; TENSILE TESTING; THIN FILM DEVICES; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

DEPOSITION;

EID: 76049121034     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2009.09.034     Document Type: Article

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