SCOPUS 정보 검색 플랫폼

Applied Physics A: Materials Science and Processing

Volumn 105, Issue 2, 2011, Pages 399-405

Vacuum ultra violet absorption spectroscopy of 193 nm photoresists

(7) Fouchier, M a Pargon, E a Azarnouche, L b Menguelti, K a Joubert, O a Cardolaccia, T c Bae, Y C c

a Laboratoire Interdisciplinaire de Physique (France)

b STMICROELECTRONICS (France)

c DOW CHEMICAL COMPANY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

193 NM PHOTORESISTS; ABSORPTION COEFFICIENTS; CHEMICAL CHANGE; EXPERIMENTAL SETUP; HEATING UP; PATTERN TRANSFERS; PLASMA TREATMENT; POLYMER CHAINS; VACUUM ULTRAVIOLETS; WAVELENGTH RANGES;

PLASMA APPLICATIONS; POLYMERS; VACUUM;

PHOTORESISTS;

EID: 83555174801 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-011-6553-3 Document Type: Article

Times cited : (16)

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