Real-time acoustic sensing and control of metalorganic chemical vapor deposition precursor concentrations delivered from solid phase sources

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 5, 2004, Pages 1984-1991

  Henn Lecordier, L ^a   Kidder Jr , J N ^a,b   Rubloff, G W ^a  

^a UNIVERSITY OF MARYLAND   (United States)

^b Vermont Technical College   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAP; DEPOSITION REACTORS; PRECURSOR DEPOSITION; SEMICONDUCTOR TECHNOLOGY;

BINARY MIXTURES; CHEMICAL VAPOR DEPOSITION; COMPOSITION; DATA ACQUISITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MIXTURES; REAL TIME SYSTEMS; SYNTHESIS (CHEMICAL); THERMODYNAMICS; VAPOR PRESSURE;

ORGANOMETALLICS;

EID: 8344232297     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1776180     Document Type: Article

References (24)

1. B. R. Butler and J. P. Stagg, J. Cryst. Growth 94, 481 (1989).
2. D. M. Frigo, W. W. Vanberkel, W. A. H. Maassen, G. P. M. Vanmier, J. H. Wilkie, and A. W. Gal, J. Cryst. Growth 124, 99 (1992).
3. D. M. Frigo, G. P. M. Vanmier, J. H. Wilkie, and A. W. Gal, Appl. Phys. Lett. 61, 531 (1992).
4. J. O. Maclean, T. Martin, M. R. Houlton, P. D. J. Calcott, S. G. Ayling, K. P. Hilton, S. A. Rushworth, and L. M. Smith, Appl. Phys. Lett. 80, 914 (2002).
5. A. Kussmaul, S. Vernon, P. C. Colter, R. Sudharsanan, A. Mastrovito, K. J. Linden, N. H. Karam, S. C. Warnick, and M. A. Dahleh, J. Electron. Mater. 26, 1145 (1997).
6. S. C. Warnick and M. A. Dahleh, IEEE Trans. Control Syst. Technol. 6, 62 (1998).
7. S. P. Watkins, T. Pinnington, J. Hu, P. Yeo, M. Kluth, N. J. Mason, R. J. Nicholas, and P. J. Walker, J. Cryst. Growth 221, 166 (2000).
8. S. Salim, K. F. Jensen, and R. D. Driver, J. Cryst. Growth 145, 28 (1994).
9. S. Salim, C. A. Wang, R. D. Driver, and K. F. Jensen, J. Cryst. Growth 169, 443 (1996).
10. D. F. Marran, C. M. Nelson, L. J. Guido, and B. Gaffey, in Proc. SPIE-Int. Soc. Opt. Eng. USA, 1999, pp. 24-31
11. K. Hanaoka, K. Tachibana, and H. Ohnishi, Thin Solid Films 262, 209 (1995).
12. K. Hanaoka, H. Ohnishi, and K. Tachibana, Jpn. J. Appl. Phys., Part 1 32, 4774 (1993).
13. M. S. Gaffney, C. M. Reaves, R. S. Smith, A. L. Holmes, and S. P. DenBaars, J. Cryst. Growth 167, 8 (1996).
14. J. P. Stagg, J. Christer, E. J. Thrush, and J. Crawley, J. Cryst. Growth 120, 98 (1992).
15. M. G. Flynn, R. Smith, P. Abraham, and S. DenBaars, IEEE Trans. Control Syst. Technol. 9, 728 (2001).
16. S. Yamamoto, K. Nagata, S. Sugai, A. Sengoku, Y. Matsukawa, T. Hattori, and S. Oda, Jpn. J. Appl. Phys., Part 1 38, 4727 (1999).
17. A. Wajid, Sens. Actuators, A 63, 41 (1997).
18. A. Wajid, Rev. Sci. Instrum. 67, 1961 (1996).
19. A. Wajid, C. Gogol, C. Hurd, M. Hetzel, A. Spina, R. Lum, M. McDonald, and R. J. Capik, J. Cryst. Growth 170, 237 (1997).
20. A. Wajid, Rev. Sci. Instrum. 71, 3461 (2000).
21. L. Henn-Lecordier, J. N. Kidder, G. W. Rubloff, C. A. Gogol, and A. Wajid, J. Vac. Sci. Technol. A 19, 621 (2001).
22. L. Henn-Lecordier, J. N. Kidder, G. W. Rubloff, C. A. Gogol, and A. Wajid, J. Vac. Sci. Technol. B 21, 1055 (2003).
23. G. W. Rubloff, in In-Situ Metrology: the Path to Real-Time Advanced Process Control (American Institute of Physics, Austin, 2003), pp. 583-592.
24. C. Gogol and A. Wajid, in Operating Manual, Composer Gas Concentration Controller (Inficon, 2000).