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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 2, 2001, Pages 621-626

Real-time growth rate metrology for a tungsten chemical vapor deposition process by acoustic sensing

(5) Henn Lecordier, L a Kidder Jr , J N a Rubloff, G W a Gogol, C A b Wajid, A b

a UNIVERSITY OF MARYLAND (United States)

b Leybold Inficon (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC WAVES; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; MOLECULAR WEIGHT; NATURAL FREQUENCIES; PROCESS ENGINEERING; SENSORS; TUNGSTEN;

ACOUSTIC SENSORS; GROWTH RATE METROLOGY; SUB-TORR PROCESS;

CHEMICAL VAPOR DEPOSITION;

EID: 0035272536 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1340656 Document Type: Article

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.