Feedback control of MOCVD growth of submicron compound semiconductor films

IEEE Transactions on Control Systems Technology

Volumn 6, Issue 1, 1998, Pages 62-71

  Warnick, Sean C ^a   Dahleh, Munther A ^a  

^a USA   (United States)

Author keywords

Nonlinear systems; Process control; Robustness; Semi conductor materials measurement; Semiconductor device manufacture; Semiconductor films; Technology transfer; Tracking

Indexed keywords

ELLIPSOMETRY; FEEDBACK CONTROL; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NONLINEAR CONTROL SYSTEMS; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR GROWTH; TECHNOLOGY TRANSFER;

SEMICONDUCTOR MATERIALS MEASUREMENTS; SUBMICRON COMPOUND SEMICONDUCTOR FILMS;

SEMICONDUCTING FILMS;

EID: 0031647694     PISSN: 10636536     EISSN: None     Source Type: Journal    
DOI: 10.1109/87.654877     Document Type: Article

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