Real-time, in situ film thickness metrology in a 10 Torr W chemical vapor deposition process using an acoustic sensor

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 3, 2003, Pages 1055-1063

  Henn Lecordier, L ^a   Kidder Jr , J N ^a   Rubloff, G W ^a   Gogol, C A ^b   Wajid, A ^b  

^a UNIVERSITY OF MARYLAND   (United States)

^b INFICON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; RESONANCE; THICKNESS CONTROL;

ACOUSTIC SENSORS;

THIN FILMS;

EID: 0038117706     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1565342     Document Type: Article

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