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Volumn 3535, Issue , 1999, Pages 24-31
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High-speed monitoring and control of CVD metal-organic precursors using FT-IR spectroscopy
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VARIABLES CONTROL;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
MONITORING;
PROCESS CONTROL;
REAL TIME SYSTEMS;
HIGH SPEED MONITORING;
METAL ORGANIC PRECURSOR FEED RATES;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
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EID: 0032681115
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
Times cited : (3)
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References (7)
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