Reproducible growth of metalorganic chemical vapor deposition derived YBa2Cu3Ox thin films using ultrasonic gas concentration analyzer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 8 B, 1999, Pages 4727-4732

  Yamamoto, Shuu'ichirou ^a   Nagata, Kouji ^b   Sugai, Satoshi ^a   Sengoku, Akio ^a   Matsukawa, Yasunari ^b   Hattori, Takeo ^b   Oda, Shunri ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TOKYO CITY UNIVERSITY   (Japan)

Author keywords

Feedback system; In situ monitoring; Metalorganic chemical vapor deposition; Reproducibility; Thin films; Ultrasonic transducer; YBa2Cu3Ox

Indexed keywords

FEEDBACK; FLOW CONTROL; FLOW MEASUREMENT; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR WEIGHT; SPECIFIC HEAT; THIN FILMS; ULTRASONIC MEASUREMENT; ULTRASONIC TRANSDUCERS; ULTRAVIOLET SPECTROSCOPY;

DIPIVALOYLMETHANATE COMPOUNDS; FEEDBACK SYSTEM; FLOW RATE; IN SITU MONITORING; PRECURSOR CONCENTRATION MONITORING; REPRODUCIBLE GROWTH; ULTRASONIC CONCENTRATION ANALYZER;

YTTRIUM BARIUM COPPER OXIDES;

EID: 0033175336     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4727     Document Type: Article

References (5)

1. M. Leskelä, H. Mölsä and L. Niinistö: Supercond. Sci. Technol. 6 (1993) 627.
2. I. M. Watson: Chem. Vap. Deposition 3 (1997) 9.
3. S. Oda, H. Zama and S. Yamamoto: J. Cryst. Growth 145 (1994) 232.
4. S. Oda, S. Yamamoto and A. Kawaguchi: J. Phys. IV (Paris) 5 (1995) C-379.
5. S. Yamamoto, A. Kawaguchi, K. Nagata, T. Hattori and S. Oda: Appl. Surf. Sci. 112 (1997) 30.