A high-speed high-sensitivity acoustic cell for in-line continuous monitoring of MOCVD precursor gases

Journal of Crystal Growth

Volumn 170, Issue 1-4, 1997, Pages 237-241

  Wajid, A ^a   Gogol, C ^a   Hurd, C ^a   Hetzel, M ^a   Spina, A ^a   Lum, R ^b   McDonald, M ^b   Capik, R J ^b  

^a Leybold Inficon   (United States)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC DEVICES; CHEMICAL VAPOR DEPOSITION; HYDROGEN; MONITORING;

ACOUSTIC CELLS; MOCVD PROCESS MONITORING;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0030647374     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(96)00554-4     Document Type: Article

References (5)

1. B.R. Buttler and J.P. Stagg, J. Crystal Growth 94 (1989) 481.
2. J.P. Stagg, J. Christer, E.J. Thrush and J. Crawley, J. Crystal Growth 120 (1992) 98.
3. E. Polturak, S.L. Garrett and S.G. Lipson, Rev. Sci. Instrum. 57 (1986) 2837.
4. L.E. Kinsler, A.R. Frey, A.B. Coppens and J.V. Sanders, Fundamentals of Acoustics (Wiley, New York, 1982) p. 148.
5. J.P. Stagg, Chemtronics 3 (1988) 44.