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Volumn 520, Issue 4, 2011, Pages 1274-1277

High quality amorphous indium zinc oxide thin films synthesized by pulsed laser deposition

(12) Socol, G a Craciun, D a Mihailescu, I N a Stefan, N a Besleaga, C b Ion, L b Antohe, S b Kim, K W c Norton, D c Pearton, S J c Galca, A C d Craciun, V a,c

a NATIONAL INSTITUTE FOR LASER (Romania)

b UNIVERSITY OF BUCHAREST (Romania)

c UNIVERSITY OF FLORIDA (United States)

d NATIONAL INSTITUTE OF MATERIALS PHYSICS (Romania)

Author keywords

Amorphous indium zinc oxide; Pulsed laser deposition; Thin films; Transparent conductive oxide

Indexed keywords

ATMOSPHERE EXPOSURE; ATOMIC CONCENTRATION; GLASS SUBSTRATES; HIGH QUALITY; INDIUM ZINC OXIDES; INDIUM-ZINC-OXIDE FILMS; OXYGEN PRESSURE; PULSED-LASER DEPOSITION TECHNIQUE; REFLECTOMETRY; ROOM TEMPERATURE; TRANSPARENT CONDUCTIVE OXIDES;

AMORPHOUS FILMS; CONDUCTIVE FILMS; DEPOSITION; GLASS LASERS; INDIUM; OPACITY; OXYGEN; OXYGEN VACANCIES; PULSED LASER DEPOSITION; PULSED LASERS; SUBSTRATES; THICK FILMS; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 82755194769 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.04.196 Document Type: Conference Paper

Times cited : (25)

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