Optical modeling and XRR/AFM characterization of highly conductive thin Ag layers

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 5, 2008, Pages 1235-1239

  Ulrich, S ^a   Pflug, A ^a   Schiffmann, K ^a   Szyszka, B ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AG THICKNESS; ARCHITECTURAL GLASS; CERAMIC TARGET; CONSTANT CHARGES; DC PLASMA; DIELECTRIC FUNCTIONS; FREE PARAMETERS; HIGH CONDUCTIVITY; LAYER STACKS; OPTICAL MEASUREMENT; OPTICAL MODELING; OTHER APPLICATIONS; SEED LAYER; SILVER LAYER; THIN AG FILMS; THIN SILVER FILMS; THIN SOLID FILM; TOP SURFACE; TRANSMITTANCE MEASUREMENTS; ZNO;

COATINGS; ELECTRON MOBILITY; EPITAXIAL GROWTH; OPTICAL DATA PROCESSING; OPTICAL FILMS; PLASMA DEPOSITION; SPECTROSCOPIC ELLIPSOMETRY; ZINC OXIDE;

SILVER;

EID: 77951130301     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200777870     Document Type: Conference Paper

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