Structural investigations of InZnO films grown by pulsed laser deposition technique

Thin Solid Films

Volumn 518, Issue 16, 2010, Pages 4564-4567

  Craciun, Doina ^a   Socol, Gabriel ^a   Stefan, Nicolaie ^a   Miroiu, Marimona ^a   Craciun, Valentin ^b  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b UNIVERSITY OF FLORIDA   (United States)

Author keywords

Indium zinc oxide; Pulsed laser deposition; TCO (transparent and conductive oxides); Thin films

Indexed keywords

ATOMIC CONCENTRATION; CONDUCTIVE OXIDES; DEPOSITED FILMS; DOPED ZNO; FLUENCES; GLASS SUBSTRATES; HOMOLOGOUS COMPOUNDS; INDIUM ZINC OXIDES; KRF LASERS; LATTICE PARAMETERS; PULSED-LASER DEPOSITION TECHNIQUE; SI(0 0 1); STRUCTURAL INVESTIGATION; WURTZITES; X-RAY DIFFRACTION INVESTIGATIONS; ZNO;

BINDING ENERGY; CONCENTRATION (PROCESS); CONDUCTIVE FILMS; DEPOSITION; INDIUM; KRYPTON; LIGHT POLARIZATION; OXIDE FILMS; PULSED LASER DEPOSITION; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC OXIDE; ZINC SULFIDE;

PULSED LASERS;

EID: 77955598321     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.12.032     Document Type: Conference Paper

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