Programmable chemical gradient patterns by soft grayscale lithography

Small

Volumn 7, Issue 23, 2011, Pages 3350-3362

  Bowen, Audrey M ^a   Ritchey, Joshua A ^a   Moore, Jeffrey S ^a   Nuzzo, Ralph G ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

gradient; grayscale lithography; photocleavable; self assembled monolayer; soft lithography

Indexed keywords

CHEMICAL GRADIENTS; COVALENT BONDING; FUNCTIONALIZED; GRADIENT; GRAY SCALE; GRAY-SCALE LITHOGRAPHY; IMAGING MODES; INHERENT FLEXIBILITY; MICROFLUIDIC GATING; MODEL SURFACE; MOLECULAR LEVELS; NON-PLANAR SUBSTRATES; NON-SPECIFIC INTERACTIONS; PHOTOCLEAVABLE; PHOTOCLEAVAGES; POLAR GROUPS; PRESSURE SENSITIVE; PROOF OF CONCEPT; SOFT LITHOGRAPHY; SPATIAL LAYOUT; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY;

CARBON BLACK; CONTACT ANGLE; EMULSIFICATION; FUNCTIONAL GROUPS; GATING AND FEEDING; HYDROPHOBICITY; IRRADIATION; LITHOGRAPHY; MICROFLUIDICS; SECONDARY ION MASS SPECTROMETRY; SELF ASSEMBLED MONOLAYERS; SILICONES; SURFACE CHEMISTRY; SURFACE PROPERTIES;

FABRICATION;

COUMARIN DERIVATIVE; DIMETICONE;

ARTICLE; CHEMISTRY; METHODOLOGY; MICROFLUIDICS; NANOTECHNOLOGY; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRAVIOLET RADIATION; VACUUM;

COUMARINS; DIMETHYLPOLYSILOXANES; MICROFLUIDICS; NANOTECHNOLOGY; SURFACE PROPERTIES; ULTRAVIOLET RAYS; VACUUM;

EID: 82555171579     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.201100920     Document Type: Article

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