Calibrating grayscale direct write bimetallic photomasks to create 3D photoresist structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 245-256

  Tu, Yuqiang ^a   Chapman, Glenn ^a   Dykes, James ^a   Poon, David ^a   Choo, Chinheng ^a   Peng, Jun ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Direct write photomask; Grayscale photomask; MEMS; Precise micromachining

Indexed keywords

BIMETALS; LASER APPLICATIONS; LIGHT TRANSMISSION; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; OXIDES; PHOTORESISTS; SPUTTERING; THIN FILMS; THREE DIMENSIONAL; X RAY DIFFRACTION ANALYSIS;

DIRECT-WRITE PHOTOMASKS; GRAYSCALE PHOTOMASKS; MEMS; PRECISE MICROMACHINING;

MASKS;

EID: 19844365415     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569405     Document Type: Conference Paper

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