Continuous-tone grayscale mask fabrication using high-energy-beam-sensitive glass

Journal of Microlithography, Microfabrication and Microsystems

Volumn 3, Issue 4, 2004, Pages 550-554

  Dillon, Thomas ^a   Sure, Anita ^a   Murakowski, Janusz ^a   Prather, Dennis ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

Gray scale lithography; Grayscale mask writing; High energy beam sensitive glass; Proximity effect; Retroreflector

Indexed keywords

GRAYSCALE LITHOGRAPHY; GRAYSCALE MASK WRITING; HIGH-ENERGY-BEAM-SENSITIVE (HEBS) GLASS; PROXIMITY EFFECTS; RETROREFLECTORS S;

CHARGE COUPLED DEVICES; CONCENTRATION (PROCESS); CRYSTALLINE MATERIALS; ELECTRON BEAMS; GLASS; LIGHT SCATTERING; LIGHTING; LITHOGRAPHY; OPTICAL DEVICES; PROBLEM SOLVING; SEMICONDUCTOR DEVICE MANUFACTURE; SENSITIVITY ANALYSIS;

MASKS;

EID: 13244265614     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1793156     Document Type: Article

References (11)

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