Laser-induced oxidation of Zn and Zn alloy films for direct-write grayscale photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6106, Issue , 2006, Pages

  Wang, Jun ^a   Chang, Marian ^a   Tu, Yuqiang ^a   Poon, David K ^a   Chapman, Glenn H ^a   Choo, Chinheng ^a   Peng, Jun ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Direct write photomask; Grayscale; Grayscale photomask; Laser induced oxidation; Optical density (OD); Photomask; Zn film

Indexed keywords

BIMETALS; DENSITY (OPTICAL); OXIDATION; SPUTTER DEPOSITION; THICK FILMS;

DIRECT-WRITE PHOTOMASK; GRAYSCALE; GRAYSCALE PHOTOMASK; LASER-INDUCED OXIDATION; PHOTOMASK; ZN FILM;

ZINC ALLOYS;

EID: 33646689591     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.648618     Document Type: Conference Paper

References (29)

1. J.D. Rogers, et al, "Realization of refractive microoptics through grayscale lithographic patterning of photosensitive hybrid glass", OPTICS EXPRESS, pp 1294-1303, 2004.
2. Chuck Wu, US Patent Nos. 4567104, 4670366, 4894303, 5078771, 5285517 and 6562523.
3. E.A.Mendoza, et al, "Continuous tone gray-scale photomask for Deep UV lithography application", Proceedings of SPIE vol. 5377, pp1059-1064, 2004.
4. C. Chen al, "Gray-scale photolithography using microfluidic photomasks",PNAS, pp 1499-1504, 2003.
5. G.H. Chapman, J. Dykes, D. Poon, C. Choo, J. Wang, Y. Tu, and J. Peng, "Creating Precise 3D Microstructures Using Laser Direct-write Bimetallic Thermal Resist Grayscale Photomasks", Proc. SPIE Photonics West: Photon Processing in Microelectronics and Photonics IV, v 5713, pp. 247-258.
6. M. V. Sarunic, G. H. Chapman, Y. Tu, "A Prototype Laser Activated Bimetallic Thermal Resist For Microfabrication", Proc. SPIE Vol. 4274, pp 183-193, January, 2001.
7. Y. Tu, G.H. Chapman J. Peng, J. Dykes, and D. Poon, "Calibrating Gray-scale Direct Write Bimetallic Photomasks to Create 3D Photoresist Structures", Proc. SPIE BACUS Symposium on Photomask Technology 24th annual, v 5567, pp 245-256, 2004.
8. G.H. Chapman, Y. Tu, J. Peng, "Creating Gray-scale Photomasks with Bimetallic Thin Film Thermal Resists", Proc. SPIE Bacus 2003, v, 5256, pg 400-411, 2003
9. T.Minami, T. Kakumu, Y.Takeda and S. Takta, "Highly transparent and conductive ZnO-In2O3 thin films prepared by d.c. magnetron sputtering", Thin solid films, 290-291, pp1-5, 1996
10. H. Chen, C. Qiu, H. Peng, Z. Xie, M. Wong and H.S. Kwok, "Co-sputter aluminum doped zinc oxide thin film as transparent anode for organic light-emitting diodes", ASID 489, pp489-492
11. C.Y. Lo, C.L. H, Q.X. Yu, H.Y. Lee and C. T.Lee, "Investigation of transparent and conductive undoped Zn2In2O5-x films deposited on n-type GaN layers", Journal of applied physics, Vol.92, No. 1. pp274-280. 2002
12. S.Middelhoek, S.A. Audet, "Silicon sensors", Academic Press, Charpter 7, 1989
13. CRC, handbook of chemisty and physics, 2004-2005
14. L. Nanai, R. Vajtai and T. George, "Laser-induced oxidation of metals: state of the art", Thin Solid Films 298, pp 160-164, 1997
15. M. Wautelet, V.Miroir, and Z.H.Huang, "CW laser-assisted oxidation of thin Cd, In, Sn, and Zn films in air", Appl. Phys. A 50, pp311-315, 1990
16. M. Oh, S. Kim and T. Seong, "Growth of nominally undoped p-type ZnO on Si by pulsed-laser deposition", Applied physics letter 87, 122103, 2005
17. Kittel, C., "Introduction to Solid State Physics", 6th Ed., New York:John Wiley, p. 185,1986
18. D. J. Ehrilich and J.Y. Tsao, "Laser microfabrication: thin film processes and lithography", ACADEMIC PRESS, INC, charpter 3, 1989
19. Maffatt. William G., The handbook o binary phase diagrams. Schenectady, N.Y., 1976
20. B.Syzyszka and S. Jager, "optical and electrical properties of doped zinc oxide films prepared by AC rezctive magnetron sputtering", Journal of New Crystalline Solides, Vol.218, pp74-80, 1997
21. A.Gulino and I. Fragala, "Depositoin and charachterization of transparent thin films of zinc oxide doped with bi and Sb", Chem. Mater. 14, pp116-121,2002
22. T. Sasabayashi, N.Ito, E. Nishimura, M. Kon, P.K.Song, K.Utsumi, A.Kaijo and Y.Shigesato, "Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering", Thin Solid Films 445, pp219-223, 2003
23. Marian Chang, "Calibration process for laser direct-write grayscale photomask", Bachelor Thesis, Simon Fraser University, Canada, 2005.
24. P.S. Patil, R.K. Kawar, T.Seth, D.P.Amalnerkar and P.S. Chigare, "Effect of substrate temperature on structural, electrical and optical properties of sprayed tin oxide(SnO2) thin films", Ceramics International 29,pp725-734,2003
25. JCPDS version 2.14 PDF-2 database (sets 1-43), copyright © 1987-1993 JCPDS-ICDD Newtown Square.PA 19073, U.S.A.
26. H.C. Panj, M.H. Shiao, C. Y. Su and C.N. Hsiao, "Influence of sputtering parameter on the optical and electrical properties of zinc-doped indium oxide thin films", J. Vac.Sci. Technol. A23(4), 2005, pp1187-1191
27. H.J. Kim, J.W. Bae, J.S.Kim, K.S. Kim, Y.C.Jang, G.Y.Yeom and N.-E. Lee, "Electrical, optical and structural characteristics of ITO thin films by krypton and oxygen dual ion-beam assisted evaporation at room temperature", Thin solid films 377-378, pp115-121, 2000
28. R. Y. Tu, "Bimetallic thermal resists for photomask micromachining and microfabrication", Ph.D Thesis, Simon Fraser University, Canada, 2005.
29. H. J., Y.Zhang, X. Chen, J. Shu, X. Luo, Z. Zhang and D. Yu, "Efficient field emission from single crystalline indium oxide pyramids", Applied Physics Letters, Vol 82, No.23,pp4146-4148, 2003