Fabrication of optical grayscale masks for tapered microfluidic devices

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 1077-1082

  Nock, Volker ^a   Blaikie, Richard J ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

Electron beam lithography; Grayscale lithography; Tapered microchannels; Thick photoresist

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; OPTICAL RESOLVING POWER; PHOTORESISTS; WAVELENGTH;

GRAYSCALE PATTERNING; HIGH-RESOLUTION PROTOTYPING; MICROFLUIDIC DEVICES;

FLUIDIC LOGIC DEVICES;

EID: 44149087616     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.01.088     Document Type: Article

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