Bimetallic thermal resists potential for double exposure immersion lithography and grayscale photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Dykes, James M ^a   Plesa, Calin ^a   Choo, Chinheng ^a   Chapman, Glenn H ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Bimetallic thin film; Direct write; Grayscale; Immersion lithography; Interference lithography; Photomask; Thermal resist; Transparency

Indexed keywords

HEAT RESISTANCE; LITHOGRAPHY; PHOTOMASKS; TRANSPARENCY;

BIMETALLIC THIN FILMS; GRAYSCALE; IMMERSION LITHOGRAPHY; INTERFERENCE LITHOGRAPHY;

THIN FILMS;

EID: 42149117439     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746990     Document Type: Conference Paper

References (8)

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2. Y. Tu, G.H. Chapman, M.V. Sarunic, "Bimetalltic Thermall Activated films for Microfabrication, Photomasks and Data Storage." Proc. of SPIE, Vol 4637, 330-340. 2002.
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4. G.H. Chapman, Y. Tu, C. Choo, J. Wang, D. Poon, M. Chang, "Laser-induced Oxidation of Metallic Thin Films as a Method for Creating Grayscale Photomasks." Proc. of SPIE, Vol 6153, 61534G:1-12. 2006.
5. Y. Tu, G.H. Chapman, "Bi/In as Patterning and Masking Layers for Alkaline-Base Si Anisotropic Etching." Proc. of SPIE, Vol 4979, 87-98. 2003.
6. Y. Tu, G.H. Chapman, J. Dykes, D. Poon, C. Choo, J. Peng, "Calibrating Grayscale Direct Write Bimetallic Photomasks to Create 3D Photoresist Structures." Proc. of SPIE, Vol 5567, 245-256. 2004.
7. G.H. Chapman, J. Dykes, D. Poon, C. Choo, J. Wang, J. Peng, Y. Tu, "Creating Precise 3D Microstructures Using Laser Direct-write Bimetallic Thermal Resist Grayscale Photomasks." Proc. of SPIE, Vol 5713, 247-258. 2005.
8. D. Poon, J. Dykes, C. Choo, J. Tsui, J. Wang, G.H. Chapman, Y. Tu, P. Reynolds, A. Zanzal, "Adding Grayscale Layer to Chrome Photomasks." Proc. of SPIE, Vol 6349, 634931:1-12. 2006.