A novel and simplified procedure for patterning hydrophobic and hydrophilic SAMs for microfluidic devices by using UV photolithography

Langmuir

Volumn 22, Issue 20, 2006, Pages 8346-8352

  Besson, Eric ^a   Gue, Anne Marie ^a   Sudor, Jan ^a   Korri Youssoufi, Hafsa ^b   Jaffrezic, Nicole ^c   Tardy, Jacques ^c  

^a LAAS CNRS   (France)

^b UNIVERSITÉ PARIS SUD   (France)

^c ECOLE CENTRALE DE LYON   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL PROTOCOLS; GLASS SUBSTRATE; INTERNAL REFLECTION INFRARED SPECTROSCOPY; MICRO FLUIDIC DEVICES; MICROCHANNELS;

ATOMIC FORCE MICROSCOPY; HYDROPHILICITY; HYDROPHOBICITY; INFRARED SPECTROSCOPY; IRRADIATION; MONOLAYERS; PHOTOLITHOGRAPHY; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

SELF ASSEMBLY;

EID: 33749612554     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la053303l     Document Type: Article

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