Laser-induced oxidation of metallic thin films as a method for creating grayscale photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Chapman, Glenn H ^a   Tu, Yuqiang ^a   Choo, Chinheng ^a   Wang, Jun ^a   Poon, David K ^a   Chang, Marian ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Direct write photomask; Grayscale photomask; Laser induced oxidation; MEMS; Microlithography

Indexed keywords

BIMETALS; BISMUTH; CONTINUOUS WAVE LASERS; DENSITY (OPTICAL); INDIUM; LITHOGRAPHY; OXIDATION; SPUTTER DEPOSITION;

DIRECT-WRITE PHOTOMASK; GRAYSCALE PHOTOMASK; LASER-INDUCED OXIDATION; MEMS; PHOTOMASKS;

THIN FILMS;

EID: 33745728112     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.657067     Document Type: Conference Paper

References (21)

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