Point defect clusters and dislocations in FIB irradiated nanocrystalline aluminum films: An electron tomography and aberration-corrected high-resolution ADF-STEM study

Microscopy and Microanalysis

Volumn 17, Issue 6, 2011, Pages 983-990

  Idrissi, Hosni ^a   Turner, Stuart ^a   Mitsuhara, Masatoshi ^c   Wang, Binjie ^a   Hata, Satoshi ^c   Coulombier, Michael ^b   Raskin, Jean Pierre ^b   Pardoen, Thomas ^b   Van Tendeloo, Gustaaf ^a   Schryvers, Dominique ^a  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

^c KYUSHU UNIVERSITY   (Japan)

Author keywords

aberration corrected high resolution ADF STEM; electron tomography; FIB; nanocrystalline aluminum; point defect clusters

Indexed keywords

ALUMINUM; ION; NANOMATERIAL; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; COMPUTER ASSISTED TOMOGRAPHY; CRYSTALLIZATION; INSTRUMENTATION; METHODOLOGY; MICROMANIPULATION; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

ALUMINUM; CRYSTALLIZATION; IONS; MICROMANIPULATION; MICROSCOPY, ELECTRON, SCANNING; MICROSCOPY, ELECTRON, TRANSMISSION; NANOSTRUCTURES; NANOTECHNOLOGY; SILICON DIOXIDE; TOMOGRAPHY, X-RAY COMPUTED;

EID: 82055166046     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S143192761101213X     Document Type: Article

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