EBM-8000: EB mask writer for product mask fabrication of 22-nm half-pitch generation and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8166, Issue , 2011, Pages

  Yoshitake, Shusuke ^a   Kamikubo, Takashi ^a   Nakayamada, Noriaki ^a   Hattori, Kiyoshi ^a   Ando, Hiroyoshi ^a   Iijima, Tomohiro ^a   Ohtoshi, Kenji ^a   Saito, Kenichi ^a   Yoshikawa, Ryoichi ^a   Tamamushi, Shuichi ^a   Tomiyoshi, Rikio ^a   Higurashi, Hitoshi ^a   Hattori, Yoshiaki ^a   Tsuchiya, Seiichi ^a   Katoh, Masayuki ^a   Suzuki, Kouichi ^a   Tachikawa, Yuichi ^a   Ogasawara, Munehiro ^a   Katsap, Victor ^b   Golladay, Steven ^b   Kendall, Rodney ^b   more..

^a NUFLARE TECHNOLOGY INC   (Japan)

^b NuFlare Technology   (United States)

Author keywords

22 nm half pitch; Current density; EBM 8000; Mask to mask overlay; Pattern fidelity; Shot count; Write time

Indexed keywords

22-NM HALF-PITCH; EBM-8000; MASK-TO-MASK OVERLAY; PATTERN FIDELITY; SHOT COUNT; WRITE-TIME;

CURRENT DENSITY; ELECTRON BEAMS; ELECTRON GUNS; EXTREME ULTRAVIOLET LITHOGRAPHY; PHOTOMASKS;

LITHOGRAPHY;

EID: 81455137650     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.898850     Document Type: Conference Paper

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