Study of heating effect on CAR in electron beam mask writing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 2, 2007, Pages

  Kamikubo, Takashi ^a   Hiramoto, Makoto ^a   Yashima, Jun ^a   Takahashi, Masazumi ^a   Nishimura, Rieko ^a   Katsumata, Takehiko ^a   Anze, Hirohito ^a   Sunaoshi, Hitoshi ^a   Tamamushi, Shuichi ^a   Ogasawara, Munehiro ^b  

^a NUFLARE TECHNOLOGY INC   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

CDU; Electron beam; Heating effect; High current density; Low sensitivity resist; Mask

Indexed keywords

CURRENT DENSITY; ELECTRIC RESISTANCE; ELECTRON BEAMS; HEATING; SENSITIVITY ANALYSIS; SPURIOUS SIGNAL NOISE; TEMPERATURE MEASUREMENT; VOLTAGE MEASUREMENT;

CURRENT PRODUCTIONS; ELECTRON BEAM MASK WRITING; HEATING EFFECTS; LOW SENSITIVITY RESISTS;

MASKS;

EID: 36248952599     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728986     Document Type: Conference Paper

References (6)

1. H.Sunaoshi et al., Proc. of SPIE Vol. 6283 628306-1 (2006)
2. H.Sakurai et al., Proc. of SPIE Vol. 3748, pp.126 - 136 (1999)
3. H.Anze et al., Proc. of SPIE Vol. 3997, pp.256 - 265 (2000)
4. th International Conference on Electron and Ion Beam Science and Technology (Electrochemical Society Pennington, N.J., 1982), pp.219
5. T.Abe et al., J.Vac.Sci.Technol. B 6 (3), pp.853 - 857 (1988)
6. International technology roadmap for semiconductors (ITRS) 2006, http://www.itrs.net/