Resolution capability of EBM-6000 and EBM-7000 for nano-imprint

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7470, Issue , 2009, Pages

  Yoshitake, S ^a   Kamikubo, T ^a  

^a NUFLARE TECHNOLOGY INC   (Japan)

Author keywords

EB mask writer; Full field template; Nano imprint lithography; Resolution

Indexed keywords

ACCELERATION VOLTAGES; BEAM BLUR; CMOS DEVICES; CRITICAL CHALLENGES; EB MASK WRITER; FINE PATTERN; FORWARD SCATTERING; FULL FIELD TEMPLATE; FULL-FIELD; MASK FABRICATION; NANO-IMPRINT; NEXT GENERATION LITHOGRAPHY; NOMINAL OPERATIONS; PATTERN RESOLUTION; PATTERNING PROCESS; POTENTIAL SOLUTIONS; RESOLUTION; RESOLUTION CAPABILITY; RESOLUTION ENHANCEMENT TECHNIQUE;

ABERRATIONS; COULOMB INTERACTIONS; CURRENT DENSITY; ELECTRON BEAM LITHOGRAPHY; ELECTRON OPTICS; ELECTRONS; MASKS;

NANOIMPRINT LITHOGRAPHY;

EID: 69949133039     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.835179     Document Type: Conference Paper

References (6)

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