Mesoscale kinetic Monte Carlo simulations of molecular resists: Effects of photoacid homogeneity on resolution, line-edge roughness, and sensitivity

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 9, Issue 1, 2010, Pages

  Lawson, Richard A ^a   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

Aggregation; Chemically amplified photoresist; Homogeneity; Line edge roughness; Mesoscale model; Photoacid generator; Resolution; Sensitivity; Stochastic model

Indexed keywords

AGGLOMERATION; COMPUTER SIMULATION; DIFFUSION; MONTE CARLO METHODS; PHOTORESISTS; ROUGHNESS MEASUREMENT; STOCHASTIC MODELS;

CHEMICALLY AMPLIFIED PHOTORESIST; HOMOGENEITY; LINE EDGE ROUGHNESS; MESOSCALE MODEL; PHOTOACID GENERATORS; SENSITIVITY;

PHOTORESISTORS;

EID: 80455131317     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3358383     Document Type: Article

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