Mesoscale simulation of molecular resists: The effect of PAG distribution homogeneity on LER

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 741-744

  Lawson, Richard A ^a   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

Kinetic Monte Carlo; Line edge roughness; Mesoscale simulation; Molecular resists; PAG aggregation

Indexed keywords

KINETIC MONTE CARLO; LINE EDGE ROUGHNESS; MESOSCALE SIMULATION; MOLECULAR RESISTS; PAG AGGREGATION;

AGGLOMERATION; DIFFUSION; MONTE CARLO METHODS; PHOTORESISTORS; PHOTORESISTS; RADIATION DAMAGE; TECHNOLOGICAL FORECASTING;

ROUGHNESS MEASUREMENT;

EID: 67349179224     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.042     Document Type: Article

References (11)

1. Chandhok M. Proc. SPIE 6519 (2007) 6519A
2. Brainard R.L., Trefonas P., Lammers J.H., Cutler C.A., Mackevich J.F., Trefonas A., and Robertson S.A. Proc. SPIE 5374 (2004) 74
3. Lavery K.A., Prabhu V.M., Lin E.K., Wu W., Satija S.K., Choi K., and Wormington M. Appl. Phys. Lett. 92 (2008) 064106
4. Woodward J.T., Hwang J., Prabhu V.M., and Choi K. AIP Conf. Proc. 931 (2007) 413
5. Jablonski E.L., Prabhu V.M., Sambasivan S., Fischer D.A., Lin E.K., Goldfarb D.L., Angelopoulos M., and Ito H. Proc. SPIE 5376 (2004) 302
6. Hirayama T., Shiono D., et al. Proc. SPIE 5753 (2005) 738
7. Lawson R.A., Lee C.T., Yueh W., Tolbert L.M., and Henderson C.L. Proc. SPIE 6923 (2008) 69230Q
8. Hassanein E., Higgins C., et al. Proc. SPIE 6921 (2008) 69211I
9. Lawson R.A., Lee C.T., Whetsell R., Yueh W., Roberts J., Tolbert L.M., and Henderson C.L. Proc. SPIE 6519 (2007) 65191N
10. Gillespie D.T. J. Phys. Chem. 81 (1977) 2340
11. Gronheid R., Van Roey F., and Van Steenwinckel D. J. Photopolym. Sci. Technol. 21 (2008) 429