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Volumn 46, Issue 9 B, 2007, Pages 6191-6197

Stochastic simulation of material and process effects on the patterning of complex layouts

Author keywords

DFM; Electron beam simulation; Layout simulation; Line width roughness; Resist dissolution; Stochastic simulation

Indexed keywords

ELECTRON-BEAM SIMULATION; LAYOUT SIMULATION; LINE-WIDTH ROUGHNESS; RESIST DISSOLUTION; STOCHASTIC SIMULATION;

COMPUTER SIMULATION; CONVOLUTION; DISSOLUTION; ELECTRON BEAMS; PARAMETER ESTIMATION; RANDOM PROCESSES; SURFACE ROUGHNESS;

PATTERN RECOGNITION;

EID: 34648815162 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.46.6191 Document Type: Article

Times cited : (19)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.