Development of electron beam resists based on amorphous polyphenols with low molecular weight and narrow dispersion

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 738-745

  Hirayama, Taku ^a   Shiono, Daiju ^a   Matsumaru, Shogo ^a   Ogata, Toshiyuki ^a   Hada, Hideo ^a   Onodera, Junichi ^a   Arai, Tadashi ^b   Sakamizu, Toshio ^b   Yamaguchi, Atsuko ^b   Shiraishi, Hiroshi ^b   Fukuda, Hiroshi ^b   Ueda, Mitsuru ^c  

^a TOKYO OHKA KOGYO CO LTD   (Japan)

^b HITACHI LTD   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous polyphenol; Chemically amplification positive tone resist; Depth profile; Homogeneous; Line edge roughness; Low molecular weight

Indexed keywords

AMORPHOUS MATERIALS; AROMATIC POLYMERS; DISSOLUTION; ELECTRON BEAMS; FOURIER OPTICS; MOLECULAR WEIGHT; PHOTORESISTS; SECONDARY ION MASS SPECTROMETRY;

AMORPHOUS POLYPHENOLS; CHEMICALLY AMPLIFICATION POSITIVE-TONE RESIST; DEPTH PROFILE; HOMOGENEOUS; LINE-EDGE ROUGHNESS; LOW MOLECULAR WEIGHT;

PHENOLS;

EID: 24644464667     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600416     Document Type: Conference Paper

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