Mesoscale simulation of positive tone chemically amplified photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 381-390

  Schmid, Gerard M ^a   Burns, Sean D ^a   Stewart, Michael D ^a   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

Author keywords

Line edge roughness; Mesoscale simulation; Photoresist; Shot noise

Indexed keywords

ACTIVATION ENERGY; COMPUTER SIMULATION; DRYING; POLYMERS; SEMICONDUCTOR SUPERLATTICES; SHOT NOISE; SPIN COATING;

LINE EDGE ROUGHNESS;

PHOTORESISTS;

EID: 0036030791     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474237     Document Type: Conference Paper

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