Deposition of multicomponent metallic glass films by single-target magnetron sputtering

Intermetallics

Volumn 21, Issue 1, 2012, Pages 105-114

  Liu, Y H ^a   Fujita, T ^a   Hirata, A ^a   Li, S ^b   Liu, H W ^a   Zhang, W ^b   Inoue, A ^b   Chen, M W ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

B. Glasses, metallic; C. Thin films; C. Vapour deposition (physical and chemical); F. Microscopy, various

Indexed keywords

ALLOY TARGET; ARGON GAS PRESSURE; ATOMICALLY FLAT SURFACE; BULK COUNTERPART; C. VAPOUR DEPOSITION (PHYSICAL AND CHEMICAL); DYNAMIC SCALING THEORY; F. MICROSCOPY , VARIOUS; FILM MICROSTRUCTURES; FILM SURFACES; FUNCTIONAL APPLICATIONS; GLASSES , METALLIC; GLASSY FILMS; GROWTH EXPONENT; KEY FACTORS; MICRO ELECTRO MECHANICAL SYSTEM; MULTICOMPONENTS; NANO-DEVICES; SPUTTERING POWER; SUPERCOOLED LIQUID REGION;

ARGON; GLASS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; METALLIC GLASS; MICROELECTROMECHANICAL DEVICES; SUPERCOOLING;

FILM GROWTH;

EID: 80155195161     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.intermet.2011.10.007     Document Type: Article

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