Correlation between sputtering parameters and composition of SmCo-based films for microelectromechanical system applications

Journal of Applied Physics

Volumn 105, Issue 6, 2009, Pages

  Peng, Long ^a   Zhang, Huaiwu ^a   Yang, Qinghui ^a   Li, Yuanxun ^a   Song, Yuanqiang ^a   Shen, Jian ^b  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AR GAS PRESSURES; COMPOSITE TARGETS; CRYSTAL TEXTURES; FILM COMPOSITIONS; IN PLANES; MICRO-ELECTRO MECHANICAL SYSTEMS; PERMANENT MAGNETIC; PREFERENTIAL SPUTTERING; REMANENCE RATIOS; SEMI-EMPIRICAL; SI SUBSTRATES; SPUTTERING PARAMETERS; SPUTTERING POWER; THEORETICAL MODELS;

COMPOSITE FILMS; HYSTERESIS; HYSTERESIS LOOPS; MAGNETIC MATERIALS; MEMS; MICROELECTROMECHANICAL DEVICES; PRESSURE EFFECTS; ZIRCONIUM;

COPPER;

EID: 63749125660     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3098230     Document Type: Article

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