TiBCN:CNx multilayer coatings deposited by pulsed closed field unbalanced magnetron sputtering

Surface and Coatings Technology

Volumn 206, Issue 4, 2011, Pages 617-622

  Lin, Jianliang ^a   Moore, John J ^a   Pinkas, Malki ^b   Zhong, Dalong ^c   Sproul, William D ^a,d  

^a Department of Metallurgical and Materials Engineering   (United States)

^b NUCLEAR RESEARCH CENTER NEGEV   (Israel)

^c GE GLOBAL RESEARCH   (United States)

^d Reactive Sputtering INC   (United States)

Author keywords

Closed field unbalanced magnetron sputtering (CFUBMS); Multilayer coating; Nanocomposite coating; Pulsed dc magnetron sputtering (PMS); TiBCN coating; TiBCN:CNx coating

Indexed keywords

CLOSED FIELD UNBALANCED MAGNETRON SPUTTERING; MULTILAYER COATING; NANOCOMPOSITE COATING; PULSED DC MAGNETRON SPUTTERING; TIBCN COATING; TIBCN:CNX COATING;

COMPOSITE COATINGS; DC POWER TRANSMISSION; HARDNESS; INORGANIC COATINGS; MAGNETRON SPUTTERING; MULTILAYERS; NANOCOMPOSITES; NANOINDENTATION; TITANIUM CARBIDE; TRANSMISSION ELECTRON MICROSCOPY; WEAR RESISTANCE; X RAY DIFFRACTION;

TUNGSTEN CARBIDE;

EID: 80054120250     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.03.050     Document Type: Article

References (36)

1. Mayrhofer P.H., Mitterer C. Surf. Coat. Technol. 2000, 133-134:131.
2. Neidhardt J., Czigány Z., Sartory B., Tessadri R., O'Sullivan M., Mitterer C. Acta Mater. 2006, 54:4193.
3. Knotek O., Breidenbach R., Jungblut F., Löffler F. Surf. Coat. Technol. 1990, 43-44:10.
4. Mitterer C., Rauter M., Rödhammer P. Surf. Coat. Technol. 1990, 41:351.
5. Lin J., Moore J.J., Mishra B., Pinkas M., Sproul W.D. Acta Mater. 2010, 58:1554.
6. Lin J., Mishra B., Moore J.J., Pinkas M., Sproul W.D. Surf. Coat. Technol. 2008, 203:588.
7. Tsai P.-C., Chen W.-J., Chen J.-H., Chang C.-L. Thin Solid Film 2009, 517:5044.
8. Lu Y., Wang J., Shen Y., Sun D. J. Mater. Res. 2009, 24(8):2520.
9. Vyas A., Lu Y.H., Shen Y.G. Surf. Coat. Technol. 2010, 204:1528.
10. Sproul W.D. Science 1996, 273:889.
11. Liu A.Y., Cohen M.L. Science 1989, 245:841.
12. Niu C., Lu Y.Z., Lieber C.M. Science 1993, 261:334.
13. Wang E.G. Prog. Mater. Sci. 1997, 41:241.
14. Muhl S., Me'ndez J.M. Diamond Relat. Mater. 1809, 8(1999).
15. Malkow T. Mater. Sci. Eng. 2001, A302:311.
16. Broitman E., Hellgren N., Wänstrand O., Johansson M.P., Berlind T., Sjöström H., Sundgren J.-E., Larsson M., Hultman L. Wear 2001, 248:55.
17. Lee K.-H., Takai O. Diamond Relat. Mater. 2005, 14:1444.
18. Torng C.J., Sivertsen J.M., Judy J.H., Chang C. J. Mater. Res. 1990, 5:2490.
19. Yoon S.F., Rusli J., Ahn J., Zhang Q., Yang C.Y., Yang H., Watt F. Thin Solid Films 1999, 340:62.
20. Koskinen J., Hirvonen J.P., Levoska J., Torri P. Diamond Relat. Mater. 1996, 5:669.
21. S'anchez-L'opez J.C., Donnet C., Belin M., Le Mogne T., Fern'andez-Ramos C., Sayagu'es M.J., Fern'andez A. Surf. Coat. Technol. 2000, 133:430.
22. Wang X.C., Li Z.Q., Wu P., Jiang E.Y., Bai H.L. Diamond Relat. Mater. 2006, 15:1732.
23. Liu C.S., Zheng Z.Y., Wu D.W., Ye M.S., Gao P., Peng Y.G., Fan X.J. Tribol. Int. 2004, 37:721.
24. Zheng X.H., Tu J.P., Song R.G. Mater. Des. 2010, 31:1716.
25. Wu M.-L., Qian W.-D., Chung Y.-W., Wang Y.-Y., Wong M.-S., Sproul W.D. Thin Solid Films 1997, 308-309:113.
26. Kim Y.J., Byun T.J., Han J.G. Surf. Coat. Technol. 2008, 203:790.
27. Wang T.S., Yu D.L., Tian Y.J., Xiao F.R., He J.L., Li D.C., Wang W.K., Li L. Chem. Phys. Lett. 2001, 334:7.
28. Liu Z.-J., Vyas A., Lu Y.H., Shen Y.G. Thin Solid Films 2005, 479:31.
29. Oliver W.C., Pharr G.M. J Mater Res 1992, 7:1564.
30. Yashar P.C., Sproul W.D. Vacuum 1999, 55:179.
31. Dong Y., Zhao W., Yue J., Li G. Appl Phys Letts. 2006, 89:121,916.
32. Cao M., Li D.J., Deng X.Y. J. Vac. Sci. Technol. A 2008, 26(5):1314.
33. Chu X., Barnett S.A. J. Appl. Phys. 1995, 77(9):4403.
34. Kato M., Mori T., Schwartz L.H. Acta Metall. 1980, 28:285.
35. Koehler J.S. Phys. Rev. B 1970, 2:547.
36. Robertson J. Mater. Sci. Eng. R Rep. 2002, 37:129.