Phase configuration, nanostructure, and mechanical behaviors in Ti-B-C-N thin films

Journal of Materials Research

Volumn 24, Issue 8, 2009, Pages 2520-2527

  Lu, Yonghao ^a   Wang, Junping ^b   Shen, Yaogen ^c   Sun, Dongbai ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b BEIJING UNIVERSITY OF CIVIL ENGINEERING AND ARCHITECTURE   (China)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS THIN FILMS; CARBON VACANCY; ELASTIC MODULUS VALUES; MECHANICAL BEHAVIOR; MICRO INDENTATION; N CONTENT; NANO GRAINS; NANO-COMPOSITE STRUCTURE; NANOCOMPOSITE THIN FILMS; NANOCRYSTALLINE SIZE; NANOCRYSTALLINES; PHASE CONFIGURATIONS; REACTIVE UNBALANCED DC MAGNETRON SPUTTERING; RESIDUAL COMPRESSIVE STRESS; SI(1 0 0); SOLID SOLUTION HARDENING;

AMORPHOUS FILMS; DISSOLUTION; MECHANICAL ENGINEERING; NANOCOMPOSITES; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURES; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; TEMPERATURE INDICATING CAMERAS; THIN FILMS; TITANIUM CARBIDE; TRANSMISSION ELECTRON MICROSCOPY;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 70049089858     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2009.0310     Document Type: Article

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