Structural and mechanical properties of facing-target sputtered amorphous CNx films

Diamond and Related Materials

Volumn 15, Issue 10, 2006, Pages 1732-1737

  Wang, X C ^a   Li, Z Q ^a   Wu, P ^a   Jiang, E Y ^a   Bai, H L ^a  

^a Institute of Advanced Materials Physics   (China)

Author keywords

Carbon nitride; Mechanical properties; Microstructure; Sputtering

Indexed keywords

CARBON NITRIDE; RAMAN SPECTROSCOPY; SATURATION (MATERIALS COMPOSITION); SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

DC FACING-TARGET REACTIVE SPUTTERING SYSTEM; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY MEASUREMENTS; NANOINDENTER MEASUREMENTS;

AMORPHOUS FILMS;

EID: 33748792328     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.03.002     Document Type: Article

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